题目：Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

作者：Chengzhao Luo¹, Yanhui Ding¹, Zhenwei Ren^1,*, Chenglong Wu¹, Yonghuan Huo¹, Xin Zhou¹, Zhiyong Zheng¹, Xinwen Wang¹, Yu Chen^1,2,*

单位：

¹School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China

²National University of Singapore Suzhou Research Institute, Dushu Lake Science and Education Innovation District, Suzhou 215123, P. R. China

摘要：The high pixel resolution is emerging as one of the key parameters for the next-generation displays. Despite the development of various quantum dot (QD) patterning techniques, achieving ultrahigh-resolution (>10,000 pixels per inch (PPI)) and high-fidelity QD patterns is still a tough challenge that needs to be addressed urgently. Here, we propose a novel and effective approach of orthogonal electric field-induced template-assisted dielectric electrophoretic deposition to successfully achieve one of the highest pixel resolutions of 23090 (PPI) with a high fidelity of up to 99%. Meanwhile, the proposed strategy is compatible with the preparation of QD pixels based on perovskite CsPbBr₃ and conventional CdSe QDs, exhibiting a wide applicability for QD pixel fabrication. Notably, we further demonstrate the great value of our approach to achieve efficiently electroluminescent QD pixels with a peak external quantum efficiency of 16.5%. Consequently, this work provides a general approach for realizing ultrahigh-resolution and high-fidelity patterns based on various QDs and a novel method for fabricating QD-patterned devices with high performance.

影响因子：20.6

分区情况：一区

链接: https://doi.org/10.1038/s41377-024-01601-3